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Bi-layer Lift-off
T-gates
Microlenses
Airbridges
PMGI Lift-off Resists
Enable high yield, metal lift-off processing in a range of applications from data storage and wireless ICs to MEMS.
- High thermal stability: Tg ∼190C
- Enables sub 0.25µm bi-layer resist imaging
- Single step development of bi-layer stack in TMAH or KOH developers
Ancillaries:
- MCC Developers
- Remover PG
- MCC Thinner
- EBR-PG
Applications
CantileversBi-layer Lift-off
T-gates
Microlenses
Airbridges
Other products in the same category:
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Tel: 86-21-64306513 E-mail: sales@aoetech.com